EUTM file information

001972751

EBPRINTER


November 23, 2000

Trademark Summary

The trademark application EBPRINTER was filed by Kabushiki Kaisha Leepl (LEEPL Corporation), a corporation established under the laws of Japan (the "Applicant"). The application was published for oppositions on June 2, 2002, and still open for oppositions.

The application was filed in Dutch (English was selected as the second language).


Goods And Services

  • The mark was filed in class 7 with Semi-conductor manufacturing apparatus, namely electron beam exposure system, electron beam lithography system, for production of electronic and optical component, integrated circuit, micro-machining component on semiconductor and other substrate, used in electronic semiconductor and micro-machine industries.
  • The mark was filed in class 9 with Electronic machines/instruments, namely electron beam exposure system, electron beam lithography system, for production and inspection of electronic and optical component, integrated circuit, micro-machining component on semiconductor and other substrate, used in electronic semiconductor and micro-machine industries.